AX5250 (5 kW) Model - purchased in 2006
| Reactor Type: | Plasma Immersion |
| Microwave Power: | 5 kW |
| Microwave Frequency: | 2.45 GHz |
| Film or thick CVD diamond at deposition rates: | up to 15 micrometer/hr |
| Typical Growth Rate: | up to 6 micrometer/h |
| Typical Mass Rate: | 60 mg/hr |
| Produces CVD diamond with high thermal conductivity: | 10 - 20 W/cm-K |
| Operation: | 10 - 100 Torr (1 - 100 Torr optional) |
| Sample size: | 50 mm (2 inch) |
Formation of thin complex films and coatings based on carbon by MW CVD method.
Typical growth rate: 2 - 5 or 6 micron/hr.